02 November 2010 15:09 [Source: ICIS news]
TORONTO (ICIS)--Dow Chemical has broken ground on a new metalorganic precursor manufacturing plant in Cheonan near ?xml:namespace>
The new plant, by Dow unit Dow Electronic Materials, was part of a plan to expand the company’s trimethylgallium (TMG) capacity to meet surging global demand for material in LED (light-emitting diodes) and related electronics markets, it said.
“The construction of our new facility in
Dow added that a TMG capacity expansion at its
Total additional capacity resulting from the multi-phase expansion plan would be 60 tonnes/year, Dow said. It did not disclose how much money it would invest in the expansion.
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