Dow Chemical breaks ground on South Korea metalorganic plant

02 November 2010 15:09  [Source: ICIS news]

TORONTO (ICIS)--Dow Chemical has broken ground on a new metalorganic precursor manufacturing plant in Cheonan near Seoul, South Korea, it said on Tuesday.

The new plant, by Dow unit Dow Electronic Materials, was part of a plan to expand the company’s trimethylgallium (TMG) capacity to meet surging global demand for material in LED (light-emitting diodes) and related electronics markets, it said.

“The construction of our new facility in Korea illustrates our commitment to investing in expansion and having supply capabilities close to our customer base in Asia,” said Joe Reiser, global business director for metalorganic technologies at Dow Electronic Materials.

Dow added that a TMG capacity expansion at its US site in North Andover, Massachusetts, was progressing as planned, with new capacity expected by the end of 2010 and continuing through the first quarter of 2011.

Total additional capacity resulting from the multi-phase expansion plan would be 60 tonnes/year, Dow said. It did not disclose how much money it would invest in the expansion.

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By: Stefan Baumgarten
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