LONDON (ICIS)--Shin-Etsu Chemical plans to invest about $125m at two plants in Japan to expand its photomask blanks business, the Japanese chemicals firm said on Thursday.
Photomask blanks are base materials for photomasks used in the manufacturing of semiconductors, and with the investment Shin-Etsu is responding to growing global demand, it said.
At Shin-Etsu’s Takefu site in Echizen City, Fukui prefecture, a new plant building will be constructed and an existing facility will be expanded, with completion targeted for early 2021.
At the Naoetsu site in Joetsu City, Niigata prefecture, an existing production facility will be expanded, with completion expected by the end of 2019.
The investment will increase capacity of Shin-Etsu’s photomask blanks by 30%, it said. It did not disclose current capacities in terms of tonnes or pounds per year.